• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a measurement technique and can be used in the industry for the production of semiconductors. The purpose of the invention is to improve the accuracy and productivity of measurement by eliminating the occurrence of subjective errors during measurement. At the input of each of the two channels 4 and 5 of the image signals of the optical comparator 6, an illumination system is installed, including combi filters 9 and 10. These combinations of filters 9 and 10 are designed so that in each case they only transmit light of a certain wavelength range. The wavelength ranges of both channels 4 and 5 of the image signals do not intersect. In one channel of the image signals in the course of the rays there is a pattern 2 (reference object), in another channel of the image signals there is a pattern 3 (test object). As a reference object, for example, a template of a set of templates with measuring marks in a separate template frame can serve. The test object can be a measurable pattern, which is also provided with a measure (L I «H) N9; o 00 IC oo gr dt l angle
    公开号:SU1291823A1
    申请号:SU837772815
    申请日:1983-02-03
    公开日:1987-02-23
    发明作者:Стефан Хартунг；Петер Клейе
    申请人:"Феб Карл-Цейс Йена" (Инопредприятие)；
    IPC主号:
    专利说明:

    telnymi tags. Each of the two objects is illuminated with light of different wavelengths in reflected or transmitted light. Both beams, in each case, through the deflecting mirrors 21-23 fall on the beam-splitting cube 24, and as a result, at the output of the optical comparator 6, a color image is obtained. This image can be observed through the oculars, with overlap errors recognized as colored edging. At the same time
    I. one.
    The invention relates to a measurement technique, in particular, to a system for photoelectronic measurement of overlap errors on measurement marks or microstructures to control the maintenance of a given accuracy of a part, and can be used in the industry for the production of semiconductors.
    A device for determining overlap errors is known, based on a flash signaling method in which two compared images are alternately displayed on a monitor. Due to the variable on and off, depending on the switching frequency on the observation side, there is a flickering or flashing signal.
    on non-overlapping parts
    (DE - AS No. 1923465, c. C 01 B 11/24, published 07.07.77).
    Closest to the invention, in technical terms, are systems for determining overlap errors on measurement marks or microstructures for monitoring the maintenance of a given part accuracy, containing an optical image comparator with two image signal channels through which, depending on the position deviation between the measurement marks of the reference object and a controlled object, located on one displaced object string in two perpendicular coordinate directions,
    a second intermediate image is created on the measurement slit 27. After the measurement slit 27, the exit pupil is shown on two radiation receivers 33 and 34. After the edges of the measuring marks are determined by calculation, the midpoints of the locations of the measuring marks are determined, and the mutual overlap of the marks of the templates 2 and 3 is determined by forming the difference. 1 Il.
    a combined mixed image is created, an illumination system for each channel of image signals comprising one combination of filters, transmitting only narrow-band light of a certain wavelength range, a lens system installed at the output of the optical comparator of the image in the plane of the intermediate combined mixed image and acting as a deviation system for light with corresponding wavelengths. A. Erben. Die Dop- pelbild inrichtung des MeBprojekters MP 320 VEB, Care Zei; ss JENA-ein wichtiges Hilfsmittel zun rationellen Durchfuhrung vieler Priifaufgaben. - Feingeratetechnik ,: 1/1976, p.23.
    The disadvantage of the known system is that the measurement is carried out subjectively by the operator and
    thus, there are subjective. errors affecting measurement accuracy. At the same time, the operator's capacity is limited, - as far as visual observation is associated with heavy load and fatigue, for the operator.
    The purpose of the invention is to increase the accuracy and productivity of measurement.
    The goal is achieved by the fact that the system for determining overlap errors on the measuring marks or microstructures for monitoring the holding of a given part accuracy, contains an optical image comparator with two channels
    image signals through which, depending on the deviation of the position between the measuring marks of the reference object and the object under control, located on the same nepg- placed in two perpendicular coordinate directions of the stage, a combined mixed image is created, the illumination system for each channel sig-aly image including one combination of filters that allows only narrowband light of a certain wavelength range to pass through, a lens system installed at the output of an optical comparato and an image plane in an intermediate image and the blend mixed acting as a deflecting systemic TeNbi for light with appropriate wavelengths, is provided arranged in the beam path of the lens by a system of means for photometric
    created in the plane of the 25th dicariously falls on one side of the mixed image of the image, located during the rays of the surface of the beam-splitting cube 24, which are perpendicular to each other. By a partial reflection and partial passage of the light rays through the beam-splitting surface passing diagonally in the cube 24, two light beams containing red and green components emerge from the beam-splitting cube 24.
    behind the second plane of the intermediate image, after another lens system, means for selectively splitting the ray path into two partial ray paths in accordance with the applied wavelengths located in each of the two partial paths by a band-pass filter and a radiation receiver and at the output of the optical comparator 6 images
    the surface of the beam-splitting cube 24, which are perpendicular to each other. By a partial reflection and partial passage of the light rays through the beam-splitting surface passing diagonally in the cube 24, two light beams containing red and green components emerge from the beam-splitting cube 24.
    a processing unit connected. to radiation receivers
    I
    40
    The drawing shows a schematic diagram of a system for determining overlap errors.
    The coordinate table 1, moving in the x and y coordinate directions perpendicular to each other, is a pattern 2 with measuring marks, serving as a reference object, and a pattern 3, for example, from a set of patterns. Template 3 is the test object and in individual frames contains measuring marks, the deviations of which from the measuring marks of template 2 are measured,
    Each of templates 2 and 3 is located in one channel 4. and 5 image signals of an optical comparator 6 are images in plane 0.
    At the input of each channel 4 and 5 of the image signals is located along a single plane of the intermediate image 0, a superimposed image is formed from both channels 4 and 5 of the image signals. Through the screen 25 (or the eyepiece) you can visually observe the image. The second image of the intermediate image plane O through the wrapping system 26 for red and green
    45
    50
    colors are transmitted to the second intermediate image plane O located at the measuring slit 27. In front of the measuring slit there is a swinging mirror 28, driving the image of the intermediate image plane O The touching mirror 28 can be replaced with another dynamic deflection system to determine the edge of the measuring marks, for example oscillating measuring gap.
    In addition, there are other possibilities for moving the image, such as, for example, by moving the coordinate to the source 7 and 8 of the light, the light of which in each case is supplied in combinations of filters 9 and 10.
    Each filter system consists of 5 of collectors 11 and 12 of filters 13 and 14 with a steep transmission curve and band-pass filters 15 and 16, which allow to achieve the required width of bands with steep edges. one
    The combination of filters 9 transmits light of wavelength A, with a bandwidth of A, in the red region, the combination of filters) ov 10 transmits light of length 5 wave with a bandwidth of LA, in the green region. Thus, through condenser 17, template 2 is illuminated with red light, and through condenser 18, template 3 is illuminated with green light. The rays passing through both channels 4 and 5 of the signals through the lenses 19 and 20 and the deflecting mirrors 21-23 are fed to the beam-splitting cube 24. Each of the two beams is perpendicular
    At the output of the optical comparator 6 images
    the surface of the beam-splitting cube 24, which are perpendicular to each other. By a partial reflection and partial passage of the light rays through the beam-splitting surface passing diagonally in the cube 24, two light beams containing red and green components emerge from the beam-splitting cube 24.
    At the output of the optical comparator 6 images
    in the intermediate image plane 0, a superimposed image is formed from both channels 4 and 5 of the image signals. Through the screen 25 (or the eyepiece) you can visually observe the image. The second image of the intermediate image plane O through the wrapping system 26 for red and green
    colors are transmitted to the second intermediate image plane O located at the measuring slit 27. In front of the measuring slit there is a swinging mirror 28, driving the image of the intermediate image plane O The touching mirror 28 can be replaced with another dynamic deflection system to determine the edge of the measuring marks, for example oscillating measuring gap.
    In addition, there are other possibilities for moving the image, such as, for example, by moving the coordinating table 1, on which templates 2 and 3 lie, and the table is connected to a high-resolution measuring system, such as a laser path measuring system. Then you can move the measuring slot 27, and this movement is determined by the measuring system on the slot. Behind the measuring slit 27, the exit pupil is guided through a lens, a horn 29 to a selective mirror 30, which causes the entire light energy E of the mixed color image to be split.
    h „
    on its components E
    and E,
    for
     /(one
    red and green colors. Filters 31 or 32 each of the two light energy components are directed to one radiation receiver 33 or 34. Filters 31 or 32 may be bandpass or interference filters to improve selectivity. The signals issued by the radiation receivers 33 and 34 are fed to the node 35 to turn signals and are defined as a function of the coordinates of the displacement or y, the data from the measuring system of the table or the measuring slit.
    After determining the edges of the measuring marks and the resulting attachment to the path measurement system, the means of the locations of the measuring marks are determined by calculation and, based on them, by mutual differences, the mutual overlap of the marks of the patterns 2 and 3 is established.
    Formula of invention
    System for determining errors It is recognized by the invention on the basis of the results of tatam expert assessments on measurement marks made by Be or microstructures to control the domain of the invention of Ger- mans holding a given accuracy by the detail of the Democratic Republic.
    Editor G. Volkova Order 223/40
    Compiled by L. Lobzova Tehred V. Kadar
    Corrector
    Tiratk (i78. The subscription
    VNIIGEI of the USSR State Committee for Inventions and Discoveries 113035, Moscow, Zh-35, Raushsk nab., 4/5
    Production and printing company, Uzhgorod, Projecto st., 4
    ten
    15
    2918236
    Drinks containing an optical comparator, images with two channels of image signals, through which, depending on the deviation of the position between the measuring marks of the reference object and the object being monitored, are located on the same subject table that is moved in two perpendicular coordinate directions, the system the illumination for each channel of the image signals, including one combination of filters that allows only narrow-band light to be detected; wavelength system, a lens system installed at the output of an optical image comparator in the plane of an intermediate superimposed mixed image and acting as a deflecting system for light with appropriate wavelengths, characterized in that it is equipped with means 26 located in the course of the rays behind the lens system 26 and 28 for photometry of a mixed image created in the plane of the intermediate image, located in the course of the rays behind the second plane of the intermediate image O behind another system l 29 by means 30 for selectively splitting the ray path into two partial ray paths in accordance with the applied wavelengths, located in each of the two partial paths by a bandpass filter 31 and 33 and a radiation receiver 33 and 34, and a result processing unit 35 connected to radiation receivers.
    20
    thirty
    35
    40
    Proofreader N.Korol
    权利要求:
    Claims (1)
    [1]
    Claim
    A system for determining overlap errors on measuring marks' or microstructures for monitoring the maintenance of a given accuracy of children - 45 ppi, containing an optical comparator, images with two channels of image signals through which, depending on the position deviation between the measuring marks of the reference object and the object being monitored, located on one object table moved in two perpendicular coordinate directions creates a combined mixed image, a lighting system for each about the channel of the image signals, including one filter combination that transmits only narrow-band light of a certain wavelength range, a lens system mounted at the output of the optical image comparator in the plane of the intermediate combined mixed image and acting as a deflecting system for light with corresponding wavelengths, characterized in that it is equipped with means 27 and 28 located during the rays behind the lens system 26 for photometry of the intermediate image created in the plane of the cm of the image located in the course of the rays behind the second plane of the intermediate image O ”behind another lens system 29 by means 30 for selectively splitting the path of the rays into two partial paths of rays in accordance with the applied wavelengths located in each of the two partial paths with a band-pass filter 31 and 33 and a radiation receiver 33 and 34 and a result processing unit 35 connected to the radiation receivers.
    It is recognized as an invention by the results of an examination carried out by the Office for Invention of the German Democratic Republic.
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    同族专利:
    公开号 | 公开日
    DE3305014A1|1983-09-08|
    DD219067A3|1985-02-20|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    DE3512615A1|1985-04-06|1986-10-16|Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar|ARRANGEMENT FOR ALIGNING, TESTING AND / OR MEASURING TWO-DIMENSIONAL OBJECTS|
    DE3517070A1|1985-05-11|1986-11-13|Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar|METHOD AND ARRANGEMENT FOR ALIGNING, TESTING AND / OR MEASURING TWO-DIMENSIONAL OBJECTS|
    DE3518043A1|1985-05-20|1986-11-20|Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar|DEVICE FOR AUTOMATICALLY DETERMINING THE DIFFERENCE BETWEEN THE STRUCTURES OF A TEMPLATE AND THOSE OF A COMPARISON OBJECT|
    DE3910048C2|1989-03-28|1991-06-20|Heidelberg Instruments Gmbh Laser- Und Ionenstrahl-, Kommunikations- Und Sensortechnik, 6900 Heidelberg, De|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    DD23778382A|DD219067A3|1982-03-01|1982-03-01|METHOD AND ARRANGEMENT FOR DETERMINING COVERAGE ERRORS|
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